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Fabrication of Fe3Si/CaF2 heterostructures ferromagnetic resonant tunneling diode by selected-area molecular beam epitaxy
http://hdl.handle.net/2241/116651
http://hdl.handle.net/2241/11665168a0cfe9-93c5-42a6-a8ba-7e1decbf68db
名前 / ファイル | ライセンス | アクション |
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Item type | Journal Article(1) | |||||
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公開日 | 2012-03-14 | |||||
タイトル | ||||||
タイトル | Fabrication of Fe3Si/CaF2 heterostructures ferromagnetic resonant tunneling diode by selected-area molecular beam epitaxy | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ | journal article | |||||
アクセス権 | ||||||
アクセス権 | open access | |||||
著者 |
Sadakuni-Makabe, Kenji
× Sadakuni-Makabe, Kenji× Suzuno, Mitsushi× Harada, Kazunori× 末益, 崇× Akinaga, Hiro |
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書誌情報 |
en : Thin solid films 巻 519, 号 24, p. 8509-8511, 発行日 2011-10 |
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ISSN | ||||||
収録物識別子タイプ | PISSN | |||||
収録物識別子 | 0040-6090 | |||||
NCID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA00863068 | |||||
DOI | ||||||
関連タイプ | isVersionOf | |||||
関連識別子 | https://doi.org/10.1016/j.tsf.2011.05.026 | |||||
権利情報 | ||||||
権利情報 | © 2011 Elsevier B.V. | |||||
権利情報 | ||||||
権利情報 | NOTICE: this is the author’s version of a work that was accepted for publication in Thin solid films. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. Changes may have been made to this work since it was submitted for publication. A definitive version was subsequently published in PUBLICATION, VOL519, ISSUE24, 2011, DOI:10.1016/j.tsf.2011.05.026 | |||||
出版タイプ | ||||||
出版タイプ | AM | |||||
出版者 | ||||||
出版者 | Elsevier |