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  1. 数理物質系 (Faculty of Pure and Applied Sciences)
  2. 都甲 薫 (Toko Kaoru)
  1. 数理物質系 (Faculty of Pure and Applied Sciences)
  2. 末益 崇 (Suemasu Takashi)
  1. コンテンツタイプ (Contents Type)
  2. 雑誌発表論文等 (Journal article, etc.)
  3. S~
  4. Scripta materialia

Orientation control of intermediate-composition SiGe on insulator by low-temperature Al-induced crystallization

http://hdl.handle.net/2241/00143669
f56d38e4-f388-48e0-b7c8-8f8b9fa93d36
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SM_122.pdf SM_122 (403.7 kB)
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item type Journal Article(1)
公開日 2016-08-24
タイトル
タイトル Orientation control of intermediate-composition SiGe on insulator by low-temperature Al-induced crystallization
言語
言語 eng
資源タイプ
タイプ journal article
著者 Nakata, Mitsuki

× Nakata, Mitsuki

WEKO 141497

Nakata, Mitsuki

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Toko, Kaoru

× Toko, Kaoru

WEKO 141498

Toko, Kaoru

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Saitoh, Noriyuki

× Saitoh, Noriyuki

WEKO 141499

Saitoh, Noriyuki

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Yoshizawa, Noriko

× Yoshizawa, Noriko

WEKO 141500

Yoshizawa, Noriko

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Suemasu, Takashi

× Suemasu, Takashi

WEKO 141501

Suemasu, Takashi

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著者別名 都甲, 薫

× 都甲, 薫

WEKO 663
e-Rad 30611280
筑波大学研究者総覧 0000003027

都甲, 薫

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末益, 崇

× 末益, 崇

WEKO 126
e-Rad 40282339
筑波大学研究者総覧 0000000714

末益, 崇

Search repository
抄録
内容記述 Metal-induced crystallization has allowed for high-quality Si and Ge thin films on insulators at low temperatures; however, there has been difficulty for SiGe alloys of intermediate compositions. Here we demonstrate a large-grained (> 100 μm), 99% (111)-oriented Si0.4Ge0.6 layer on a glass substrate through layer exchange between Al and amorphous Si0.4Ge0.6 layers. Slow annealing below 350 °C is a key to suppressing nucleation and facilitating lateral growth. The use of the (111)-oriented SiGe layers as epitaxial templates will pave the way for integrating various materials monolithically on three-dimensional Si large-scale integrated circuits and on multi-functional displays.
書誌情報 Scripta Materialia

巻 122, p. 86-88, 発行日 2016-09
ISSN
収録物識別子 1359-6462
書誌レコードID
収録物識別子 AA11067905
DOI
関連識別子
関連識別子 10.1016/j.scriptamat.2016.05.025
権利
権利情報 © 2016.
権利
権利情報 This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/.
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出版者 Elsevier
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