@article{oai:tsukuba.repo.nii.ac.jp:00029408,
 author = {Baba, M. and Toh, K. and 都甲, 薫 and TOKO, Kaoru and Hara, K.O. and Usami, N. and Saito, N. and Yoshizawa, N. and 末益, 崇 and SUEMASU, Takashi},
 journal = {Journal of crystal growth},
 month = {Sep},
 pages = {193--197},
 title = {Formation of large-grain-sized BaSi2 epitaxial layers grown on Si(111) by molecular beam epitaxy},
 volume = {378},
 year = {2013},
 yomi = {トコウ, カオル and スエマス, タカシ}
}