@article{oai:tsukuba.repo.nii.ac.jp:00028621,
 author = {Nakamura, K. and Baba, M. and Ajmal, Khan M. and Du, W. and Sasase, M. and Hara, K. O. and Usami, N. and 都甲, 薫 and TOKO, Kaoru and 末益, 崇 and SUEMASU, Takashi},
 issue = {5},
 journal = {Journal of Applied Physics},
 month = {Feb},
 title = {Lattice and grain-boundary diffusions of boron atoms in BaSi2 epitaxial films on Si(111)},
 volume = {113},
 year = {2013},
 yomi = {トコウ, カオル and スエマス, タカシ}
}