@article{oai:tsukuba.repo.nii.ac.jp:00017394, author = {Uematsu, Masashi and Kageshima, Hiroyuki and 白石, 賢二 and SHIRAISHI, Kenji}, issue = {3}, journal = {Journal of applied physics}, month = {Feb}, pages = {1948--1953}, title = {Simulation of wet oxidation of silicon based on the interfacial silicon emission model and comparison with dry oxidation}, volume = {89}, year = {2001}, yomi = {シライシ, ケンジ} }