2024-03-29T06:41:31Z
https://tsukuba.repo.nii.ac.jp/oai
oai:tsukuba.repo.nii.ac.jp:00056069
2023-03-17T01:16:29Z
117:5135
3:62:5592:615
Dry and wet etching for β-Ga2O3 Schottky barrier diodes with mesa termination
奥村, 宏典
オクムラ, ヒロノリ
OKUMURA, Hironori
Tanaka, Taketoshi
journal article
IOP Publishing
The Japan Society of Applied Physics
2019-12
application/pdf
Japanese Journal of Applied Physics
12
58
120902
0021-4922
AA12295836
https://tsukuba.repo.nii.ac.jp/record/56069/files/JJAP_58-12.pdf
eng
https://doi.org/10.7567/1347-4065/ab4f90
(c) 2019 The Japan Society of Applied Physics
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open access