2024-03-29T13:58:14Z
https://tsukuba.repo.nii.ac.jp/oai
oai:tsukuba.repo.nii.ac.jp:00037798
2023-12-25T01:54:16Z
117:1717
117:494
3:62:5592:74
Evaluation of band offset at amorphous-Si/BaSi2 interfaces by hard x-ray photoelectron spectroscopy
Takabe, Ryota
Takeuchi, Hiroki
Du, Weijie
Ito, Keita
都甲, 薫
トコウ, カオル
TOKO, Kaoru
Ueda, Shigenori
Kimura, Akio
末益, 崇
スエマス, タカシ
SUEMASU, Takashi
journal article
American Institute of Physics
2016-04
application/pdf
Journal of Applied Physics
16
119
165304
0021-8979
AA00693547
https://tsukuba.repo.nii.ac.jp/record/37798/files/JAP_119-16.pdf
eng
https://doi.org/10.1063/1.4947501
© 2016 AIP Publishing LLC.
This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.The following article appeared in J. Appl. Phys. 119, 165304 (2016) and may be found at http://dx.doi.org/10.1063/1.4947501.
open access