2024-03-29T14:30:23Z
https://tsukuba.repo.nii.ac.jp/oai
oai:tsukuba.repo.nii.ac.jp:00018532
2023-12-21T06:19:57Z
117:144
3:62:5296:64
Influence of spin density in implanted Si layers on pulsed-laser annealing
村上, 浩一
ムラカミ, コウイチ
MURAKAMI, Kouichi
Ikawa, E.
Gamo, K.
Namba, S.
Akasaka, Y.
journal article
AIP Publishing
1979-09
application/pdf
Applied Physics Letters
5
35
413
415
0003-6951
AA00543431
https://tsukuba.repo.nii.ac.jp/record/18532/files/APL_35-5.pdf
eng
https://doi.org/10.1063/1.91144
© 1979 American Institute of Physics.
open access