2024-03-28T15:12:24Z
https://tsukuba.repo.nii.ac.jp/oai
oai:tsukuba.repo.nii.ac.jp:00050166
2023-09-28T03:18:18Z
117:1717
117:494
3:62:5296:4854
Impact of deposition pressure and two-step growth technique on the photoresponsivity enhancement of polycrystalline BaSi2 films formed by sputtering
都甲, 薫
トコウ, カオル
TOKO, Kaoru
末益, 崇
スエマス, タカシ
SUEMASU, Takashi
Matsuno, Satoshi
Nemoto, Taira
Mesuda, Masami
Kuramochi, Hideto
open access
(c) 2019 The Japan Society of Applied Physics
This is the Accepted Manuscript version of an article accepted for publication in Applied Physics Express. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at https://doi.org/10.7567/1882-0786/aafc70
IOP Publishing
The Japan Society of Applied Physics
2019-02
eng
journal article
AM
http://hdl.handle.net/2241/00155619
https://tsukuba.repo.nii.ac.jp/records/50166
https://doi.org/10.7567/1882-0786/aafc70
1882-0778
AA12295133
Applied Physics Express
12
2
021004
https://tsukuba.repo.nii.ac.jp/record/50166/files/APEX_12-2.pdf
application/pdf
475.3 kB
2020-02-01