2024-03-29T08:47:42Z
https://tsukuba.repo.nii.ac.jp/oai
oai:tsukuba.repo.nii.ac.jp:00018565
2023-12-25T01:45:42Z
117:494
3:62:5592:74
Hole mobility of p-type beta-FeSi2 thin films grown from Si/Fe multilayers
Takakura, K.
Ohyama, H.
Takarabe, K.
末益, 崇
スエマス, タカシ
SUEMASU, Takashi
Hasegawa, F.
open access
© 2005 American Institute of Physics
American Institute of Physics
2005-04
eng
journal article
VoR
http://hdl.handle.net/2241/104225
https://tsukuba.repo.nii.ac.jp/records/18565
https://doi.org/10.1063/1.1891279
0021-8979
AA00693547
Journal of applied physics
97
09
093716
https://tsukuba.repo.nii.ac.jp/record/18565/files/JAP_97-09.pdf
application/pdf
155.3 kB
2013-12-20