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Impact of deposition pressure and two-step growth technique on the photoresponsivity enhancement of polycrystalline BaSi2 films formed by sputtering
http://hdl.handle.net/2241/00155619
http://hdl.handle.net/2241/001556193fcdec37-7379-4b17-920a-91bc65cc3287
名前 / ファイル | ライセンス | アクション |
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APEX_12-2.pdf (475.3 kB)
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Item type | Journal Article(1) | |||||
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公開日 | 2019-05-23 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Impact of deposition pressure and two-step growth technique on the photoresponsivity enhancement of polycrystalline BaSi2 films formed by sputtering | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源 | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | journal article | |||||
アクセス権 | ||||||
アクセス権 | open access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
著者 |
都甲, 薫
× 都甲, 薫× 末益, 崇× Matsuno, Satoshi× Nemoto, Taira× Mesuda, Masami× Kuramochi, Hideto |
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書誌情報 |
en : Applied Physics Express 巻 12, 号 2, p. 021004, 発行日 2019-02 |
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ISSN | ||||||
収録物識別子タイプ | PISSN | |||||
収録物識別子 | 1882-0778 | |||||
書誌レコードID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA12295133 | |||||
DOI | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | DOI | |||||
関連識別子 | https://doi.org/10.7567/1882-0786/aafc70 | |||||
権利 | ||||||
言語 | en | |||||
権利情報 | (c) 2019 The Japan Society of Applied Physics | |||||
権利 | ||||||
言語 | en | |||||
権利情報 | This is the Accepted Manuscript version of an article accepted for publication in Applied Physics Express. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at https://doi.org/10.7567/1882-0786/aafc70 | |||||
出版タイプ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
出版者 | ||||||
言語 | en | |||||
出版者 | IOP Publishing | |||||
出版者 | ||||||
言語 | en | |||||
出版者 | The Japan Society of Applied Physics |